SUOYI Spherical Yttrium Oxide Powder Y₂O₃ Spherical Yttria Powder
2026-10-22
SUOYI Spherical Yttrium Oxide Powder Y₂O₃ Spherical Yttria Powder
High Purity Spherical Yttrium Oxide Powder Y2O3 3N 4N 5N CAS1314-36-9 for Semiconductor Plasma Spray Coating
Description
Spherical Yttria Y2O3 powder manufactured by spray granulation and high temperature sintering. Good flowability, high packing density, narrow PSD. Excellent resistance to fluorine plasma corrosion, widely used for semiconductor chamber coating, thermal spray, laser cladding, YSZ stabilizer, ceramic additive, 3D printing ceramic parts.
Purity:99.9%~99.9999%, particle size can be customized. Sample available. 25kg per drum.
Description
Spherical Yttria Y2O3 powder manufactured by spray granulation and high temperature sintering. Good flowability, high packing density, narrow PSD. Excellent resistance to fluorine plasma corrosion, widely used for semiconductor chamber coating, thermal spray, laser cladding, YSZ stabilizer, ceramic additive, 3D printing ceramic parts.
Purity:99.9%~99.9999%, particle size can be customized. Sample available. 25kg per drum.
Chemical Formula: Y₂O₃
CAS: 1314-36-9
Basic Parameters of Spherical Yttria Powder
- Appearance: White spherical powder
- Melting Point: 2425°C
- True density:5.01 g/cm³
- Purity Grade
3N(99.9%),4N(99.99%),5N(99.999%),6N(99.9999%)
- Particle Size
Nano / 5μm /10μm /15–30μm /20–50μm, customized
- Available Purity: 99.9% (3N) / 99.99% (4N) / 99.999% (5N) / 6N
- Particle Size: Nanoscale or microscale (5μm / 10μm / 20–50μm; customizable)
- Characteristics: Spherical particles, excellent flowability, high tap density, uniform sintering; high-temperature resistance, plasma-etching resistance, electrical insulation, and strong chemical stability.
CAS: 1314-36-9
Basic Parameters of Spherical Yttria Powder
- Appearance: White spherical powder
- Melting Point: 2425°C
- True density:5.01 g/cm³
- Purity Grade
3N(99.9%),4N(99.99%),5N(99.999%),6N(99.9999%)
- Particle Size
Nano / 5μm /10μm /15–30μm /20–50μm, customized
- Available Purity: 99.9% (3N) / 99.99% (4N) / 99.999% (5N) / 6N
- Particle Size: Nanoscale or microscale (5μm / 10μm / 20–50μm; customizable)
- Characteristics: Spherical particles, excellent flowability, high tap density, uniform sintering; high-temperature resistance, plasma-etching resistance, electrical insulation, and strong chemical stability.
Our spherical yttrium oxide powder adopts spray granulation and high-temperature sintering technology. Compared with conventional crushed yttria powder, our product features perfect spherical shape, outstanding powder flowability and high tap density. It ensures stable powder feeding during plasma spraying and laser cladding, producing dense, low-porosity coating with strong anti-plasma corrosion performance.
This high purity yttria powder is mainly applied in semiconductor equipment chamber protective coating, thermal barrier coating, advanced ceramic raw material, YSZ stabilizer, optical material and additive manufacturing. We support custom purity and particle size, with strict quality inspection before shipment.
This high purity yttria powder is mainly applied in semiconductor equipment chamber protective coating, thermal barrier coating, advanced ceramic raw material, YSZ stabilizer, optical material and additive manufacturing. We support custom purity and particle size, with strict quality inspection before shipment.
Spherical morphology, excellent flowability & high tap density
Narrow particle size distribution, stable feeding for thermal spray
High plasma corrosion resistance against halogen plasma
Superior electrical insulation, low outgassing
High thermal stability, chemical inertness
Applications
Semiconductor plasma spray coating (chamber, electrostatic chuck)
Thermal spray / laser cladding, thermal barrier coating
Ceramic additive for YSZ, transparent ceramics, dental ceramics
Additive manufacturing (3D printing of yttria ceramic parts)
Phosphor, optical glass, laser crystal raw material
High temperature refractory & insulating components
Narrow particle size distribution, stable feeding for thermal spray
High plasma corrosion resistance against halogen plasma
Superior electrical insulation, low outgassing
High thermal stability, chemical inertness
Applications
Semiconductor plasma spray coating (chamber, electrostatic chuck)
Thermal spray / laser cladding, thermal barrier coating
Ceramic additive for YSZ, transparent ceramics, dental ceramics
Additive manufacturing (3D printing of yttria ceramic parts)
Phosphor, optical glass, laser crystal raw material
High temperature refractory & insulating components
Key Advantages of Spherical Yttria Powder
1. Excellent flowability ensures stable powder feeding; ideal for thermal spraying, laser cladding, and 3D printing.
2. Dense particles result in high-density coatings with minimal porosity and superior resistance to plasma corrosion.
3. Narrow particle size distribution ensures consistent sintering, reducing defects in ceramic components.
4. High electrical insulation and low outgassing; the preferred choice for protective coatings in semiconductor process chambers.
1. Excellent flowability ensures stable powder feeding; ideal for thermal spraying, laser cladding, and 3D printing.
2. Dense particles result in high-density coatings with minimal porosity and superior resistance to plasma corrosion.
3. Narrow particle size distribution ensures consistent sintering, reducing defects in ceramic components.
4. High electrical insulation and low outgassing; the preferred choice for protective coatings in semiconductor process chambers.
Main Applications of Spherical Yttria Powder
1. Semiconductor Plasma-Sprayed Coatings: Used for etching chamber components and electrostatic chucks (ESCs) to provide resistance against fluorine-based plasma corrosion and reduce particle contamination (primary application).
2. Thermal Spraying / Laser Cladding: Protective coatings for high-temperature and wear-resistant applications, as well as thermal barrier coatings (TBCs) in aerospace.
3. 3D Printing (Additive Manufacturing): Production of yttria-based ceramic components.
4. Ceramic Additives: Stabilizer for zirconia (YSZ), specialized transparent ceramics, and additives for dental ceramics.
5. Raw material for phosphors, LEDs, optical glass, and laser crystals.
6. Refractory materials, high-temperature insulation components, catalyst supports
1. Semiconductor Plasma-Sprayed Coatings: Used for etching chamber components and electrostatic chucks (ESCs) to provide resistance against fluorine-based plasma corrosion and reduce particle contamination (primary application).
2. Thermal Spraying / Laser Cladding: Protective coatings for high-temperature and wear-resistant applications, as well as thermal barrier coatings (TBCs) in aerospace.
3. 3D Printing (Additive Manufacturing): Production of yttria-based ceramic components.
4. Ceramic Additives: Stabilizer for zirconia (YSZ), specialized transparent ceramics, and additives for dental ceramics.
5. Raw material for phosphors, LEDs, optical glass, and laser crystals.
6. Refractory materials, high-temperature insulation components, catalyst supports
Preparation Process for Spherical Yttrium Oxide Powder
Spray granulation followed by high-temperature sintering (mainstream method); hydrothermal or precipitation methods (for nano-scale spherical particles)
Spray granulation followed by high-temperature sintering (mainstream method); hydrothermal or precipitation methods (for nano-scale spherical particles)
Packaging Specifications for Spherical Yttrium Oxide Powder
25 kg/drum (with an inner aluminum foil bag); smaller sample sizes (1 kg/5 kg) also available
25 kg/drum (with an inner aluminum foil bag); smaller sample sizes (1 kg/5 kg) also available
Spherical Yttrium Oxide Powder, Y2O3 spherical powder, high-purity yttria, plasma-spray-grade yttria powder, yttrium oxide for semiconductor coatings, 3N/4N/5N Y2O3
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